Exposure Equipment - 企業ランキング(全32社)
更新日： 集計期間:Jun 24, 2026〜Jul 21, 2026
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企業情報を表示
| 会社名 | 代表製品 | ||
|---|---|---|---|
| 製品画像・製品名・価格帯 | 概要 | 用途/実績例 | |
| The film corresponds from a strip to a roll, and the film is controlled by EPC to suppress waviness, perform optical alignment, and achieve ... | 3D, touch panel, FPC, OLED exposure, etc. | ||
| Work size: φ200, 300mm Exposure method: Compatible with vacuum contact, hard contact, and proximity Lamp house: 3.5KW or 5KW Illumina... | MLCSP、Ｃ-MOSno | ||
| Supports 2, 6, and 8-inch or square substrates; alignment is automatic and parallel, with gap control also automatic, while the loading and ... | Wafers, etc. | ||
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清和光学製作所
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- 代表製品
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Roll-to-roll exposure device for film
- 概要
- The film corresponds from a strip to a roll, and the film is controlled by EPC to suppress waviness, perform optical alignment, and achieve ...
- 用途/実績例
- 3D, touch panel, FPC, OLED exposure, etc.
Fully automatic double-sided exposure device for φ300mm (12-inch) wafers.
- 概要
- Work size: φ200, 300mm Exposure method: Compatible with vacuum contact, hard contact, and proximity Lamp house: 3.5KW or 5KW Illumina...
- 用途/実績例
- MLCSP、Ｃ-MOSno
Prototype mass production compatible semi-automatic exposure device
- 概要
- Supports 2, 6, and 8-inch or square substrates; alignment is automatic and parallel, with gap control also automatic, while the loading and ...
- 用途/実績例
- Wafers, etc.
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清和光学製作所
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