Exposure Equipment - Company Ranking(32 companies in total)
Last Updated： Aggregation Period:Aug 12, 2026〜Sep 08, 2026
This ranking is based on the number of page views on our site.
Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| 【Main Features】 ○ Compatible with g/h/i/248mm and broad light ○ Exposure area □ 10mm/25 shots □ 5mm/100 shots ○ Equipped with resist... | For more details, please refer to the catalog or contact us. | ||
| 【Main Features】 ○ Compatible with g/h/i/248mm and broad light ○ Exposure area □10mm/25 shots □5mm/100 shots ○ Equipped with resist t... | For more details, please refer to the catalog or contact us. | ||
| 【Main Features】 ●Equipped with Energetiq Technology's EQ-10 EUV Source ●Capable of EUV (13.5nm) exposure For more details, please contact u... | For more details, please refer to the catalog or contact us. | ||
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リソテックジャパン
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- Featured Products
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Photo Process Analysis Exposure Device UVES Series
- overview
- 【Main Features】 ○ Compatible with g/h/i/248mm and broad light ○ Exposure area □ 10mm/25 shots □ 5mm/100 shots ○ Equipped with resist...
- Application/Performance example
- For more details, please refer to the catalog or contact us.
Photo Process Analysis Exposure Device ES-3500LP
- overview
- 【Main Features】 ○ Compatible with g/h/i/248mm and broad light ○ Exposure area □10mm/25 shots □5mm/100 shots ○ Equipped with resist t...
- Application/Performance example
- For more details, please refer to the catalog or contact us.
EUV exposure device for resist analysis EUVES-7000
- overview
- 【Main Features】 ●Equipped with Energetiq Technology's EQ-10 EUV Source ●Capable of EUV (13.5nm) exposure For more details, please contact u...
- Application/Performance example
- For more details, please refer to the catalog or contact us.
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リソテックジャパン
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