Exposure Equipmentのメーカーや取扱い企業、製品情報、参考価格、ランキングをまとめています。
イプロスは、 製造業 BtoB における情報を集めた国内最大級の技術データベースサイトです。

Exposure Equipment - 企業ランキング(全32社)

更新日: 集計期間:Jun 24, 2026〜Jul 21, 2026
※当サイトの各ページの閲覧回数を元に算出したランキングです。

会社名 代表製品
製品画像・製品名・価格帯 概要 用途/実績例
The film corresponds from a strip to a roll, and the film is controlled by EPC to suppress waviness, perform optical alignment, and achieve ... 3D, touch panel, FPC, OLED exposure, etc.
Work size: φ200, 300mm Exposure method: Compatible with vacuum contact, hard contact, and proximity Lamp house: 3.5KW or 5KW Illumina... MLCSP、C-MOSno
Supports 2, 6, and 8-inch or square substrates; alignment is automatic and parallel, with gap control also automatic, while the loading and ... Wafers, etc.
---

---

--- ---
  1. 代表製品
    Roll-to-roll exposure device for filmRoll-to-roll exposure device for film
    概要
    The film corresponds from a strip to a roll, and the film is controlled by EPC to suppress waviness, perform optical alignment, and achieve ...
    用途/実績例
    3D, touch panel, FPC, OLED exposure, etc.
    Fully automatic double-sided exposure device for φ300mm (12-inch) wafers.Fully automatic double-sided exposure device for φ300mm (12-inch) wafers.
    概要
    Work size: φ200, 300mm Exposure method: Compatible with vacuum contact, hard contact, and proximity Lamp house: 3.5KW or 5KW Illumina...
    用途/実績例
    MLCSP、C-MOSno
    Prototype mass production compatible semi-automatic exposure devicePrototype mass production compatible semi-automatic exposure device
    概要
    Supports 2, 6, and 8-inch or square substrates; alignment is automatic and parallel, with gap control also automatic, while the loading and ...
    用途/実績例
    Wafers, etc.